发明名称 MANUFACTURING APPARATUS FOR ORIENTED FILM, MANUFACTURING METHOD FOR ORIENTED FILM, LIQUID CRYSTAL DEVICE, AND ELECTRONIC DEVICE
摘要 A manufacturing apparatus for manufacturing an oriented film of a liquid crystal device holding a liquid crystal between a pair of substrates facing each other, comprising: a film formation chamber; an evaporation section having an evaporation source, evaporating an oriented film material on the substrate by a physical vapor deposition, and forming the oriented film in the film formation chamber; a shielding plate arranged between the evaporation section and the substrate, having an elongated opening for selectively evaporating the oriented film material, and covering an area of the substrate on which the oriented film is not formed; and a first regulating member arranged between the evaporation source and the shielding plate and at a position closer to the evaporation source than from the shielding plate, regulating a sublimating direction in which the oriented film material is sublimated.
申请公布号 US2010128212(A1) 申请公布日期 2010.05.27
申请号 US20100689403 申请日期 2010.01.19
申请人 SEIKO EPSON CORPORATION 发明人 NAKATA HIDEO;MIYAKAWA TAKUYA;OKUYAMA NORIO
分类号 G02F1/1337;C23C14/34 主分类号 G02F1/1337
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