发明名称 Resistance-variable memory device, method for fabricating the same and memory system including the same
摘要 In the method of fabricating the variable-resistance memory device, a substrate including a conductive region is provided, and a preliminary lower electrode is formed on the conductive region. A lower electrode is formed by oxidizing an upper portion of the preliminary lower electrode. A phase-change material layer is formed on the lower electrode.
申请公布号 US2010129947(A1) 申请公布日期 2010.05.27
申请号 US20090591393 申请日期 2009.11.18
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE HYUN-SUK;LIM TAI-SOO;LIM HYUNSEOK;PARK INSUN;CHOI JAEHYOUNG
分类号 H01L45/00;H01L21/00 主分类号 H01L45/00
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