发明名称 Method for etching glass or metal substrates using negative photoresist and method for fabricating cliche using the same
摘要 The present invention relates to a method for etching glass or metal using a negative photoresist and a method for fabricating a cliche using the same. In the method for etching glass or metal according to the present invention, since adhesion strength between the negative photoresist and the metal or the metal oxide is excellent, the photoresist layer is not corroded by the metal or metal oxide etching solution, it is unnecessary to produce an inverse photomask, the fabrication process is simple, and a low resolution light source such as mixed wavelength type light source is capable of being used, thus, economic efficiency is ensured.
申请公布号 US2010126367(A1) 申请公布日期 2010.05.27
申请号 US20080451225 申请日期 2008.09.22
申请人 KIM JI-SU;JEON KYOUNG-SU;CHOI KYUNG-SOO;YI GI-RA;LEE SEUNG-HEON;SHIN DONG-MYUNG 发明人 KIM JI-SU;JEON KYOUNG-SU;CHOI KYUNG-SOO;YI GI-RA;LEE SEUNG-HEON;SHIN DONG-MYUNG
分类号 B41N1/00;G03F7/20 主分类号 B41N1/00
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