| 摘要 |
<p>Disclosed is a beam processing apparatus that processes a layer to be processed (3) formed on one surface of a glass substrate (2), by irradiating the same with a beam. An objective optical apparatus (51) of a beam irradiating means (50) comprises a conical lens as an axially-condensing optical element (52) in order to emit Bessel beams. A Bessel beam is an axially-condensed beam and the diameter of the beam, in particular the diameter of the region in the center where the intensity peaks, does not change greatly in the range where the distance from the conical lens is short. Therefore, even if the position on the objective optical apparatus (51) irradiated by the beam changes due to deflection of the substrate, the position would still be within the range of the focus depth of the Bessel beam, thus enabling highly accurate processing without having to implement control such as changing the focal position during processing.</p> |
