发明名称 Non-diffusion junction split-gate nonvolatile memory cells and arrays, methods of programming, erasing, and reading thereof, and methods of manufacture
摘要 Nonvolatile flash memory systems and methods are disclosed having a semiconductor substrate of a first conductivity type, including non-diffused channel regions through which electron flow is induced by application of voltage to associated gate elements. A plurality of floating gates are spaced apart from one another and each insulated from the channel region. A plurality of control gates are spaced apart from one another and insulated from the channel region, with each control gate being located between a first floating gate and a second floating gate and capacitively coupled thereto to form a subcell. A plurality of spaced-apart assist gates are insulated from the channel region, with each assist gate being located between and insulated from adjacent subcells. The channel is formed of three regions, two beneath adjacent control gate elements as well as a third region between the first two and beneath an associated assist gate.
申请公布号 US7723774(B2) 申请公布日期 2010.05.25
申请号 US20070775851 申请日期 2007.07.10
申请人 SILICON STORAGE TECHNOLOGY, INC. 发明人 CHEN CHANGYUAN;LIN YA-FEN;LEE DANA
分类号 H01L29/788 主分类号 H01L29/788
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