| 摘要 |
PURPOSE: A semiconductor device and a method for forming the same are provided to prevent the short circuit between a contact and a conductive layer by forming a conductive layer regardless of the location of contact. CONSTITUTION: In a semiconductor device and a method for forming the same, a first interlayer insulating film(102), a conductive layer(104), and a second inter dielectric(106) are formed on the semiconductor substrate. A contact hole passes through the second inter dielectric layer, the conductive layer, and the first interlayer insulating film so that the semiconductor substrate is exposed. The insulating layer is formed in the side wall of the contact hole.
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