发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE FILM USING THE SAME, METHOD OF FORMING RESIST PATTERN, PRINTED WIRING BOARD, AND METHOD OF MANUFACTURING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition, capable of securing flame retardancy without having to use a halogen-based flame retardant and superior in resolution, resistance to electrolytic corrosion, and storage stability, and a photosensitive film that uses the composition, and to provide a method of forming resist pattern, a printed wiring board, and a method of manufacturing the same. <P>SOLUTION: The photosensitive resin composition includes (A) a polymer including a carboxyl group, (B) a photopolymerizable compound containing an ethylenically unsaturated bond, (C) a photo polymerization initiator, and (D) a phenoxy phosphazene compound, wherein the content of the (D) component is 30-70 pts.wt. with respect to 100 pts.wt. of the total amount of the (A) component and the (B) component. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010113364(A) 申请公布日期 2010.05.20
申请号 JP20090294995 申请日期 2009.12.25
申请人 HITACHI CHEM CO LTD 发明人 MORITA MASAKI;HATAKEYAMA SHUICHI
分类号 G03F7/004;H05K3/06;H05K3/18 主分类号 G03F7/004
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