发明名称 IMPRINT LITHOGRAPHY
摘要 <P>PROBLEM TO BE SOLVED: To solve a problem that since template holders occupy a significant amount of space in an imprint lithography apparatus, there is not sufficient space to provide an imprint template to imprint every imprint area at the same time. <P>SOLUTION: The imprint lithography apparatus has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged to hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010114473(A) 申请公布日期 2010.05.20
申请号 JP20100027357 申请日期 2010.02.10
申请人 ASML NETHERLANDS BV 发明人 KRUIJT-STEGEMAN YVONNE WENDELA;WUISTER SANDER FREDERIK;DIJKSMAN JOHAN FREDERIK;ALEKSEY YURIEVICH KOLESNYCHENKO;VAN DER MAST KAREL DIEDERICK;SIMON KLAUS;KNAAPEN RAYMOND JACOBUS;KRASSIMIR TODOROV KRASTEV
分类号 H01L21/027;B29C59/02 主分类号 H01L21/027
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