FLY EYE INTEGRATOR, ILLUMINATOR, AND LITHOGRAPHIC DEVICE AND METHOD

摘要

PROBLEM TO BE SOLVED: To provide a lithographic device and method for EUV emission lithography, wherein loss of emission intensity and/or increased complexity of the device is removed or reduced.

SOLUTION: The transmission type fly eye integrator including a first array of lenses and a second array of lenses is disclosed. The fly eye integrator is formed by combining the first array of lenses with the second array of lenses, and the first array of lenses and the second array of lenses each include a lens having a diameter selected from a range of 5-50 μm and a curvature radius selected from a range of 25-2,500 μm.

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