| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device including an exposure processing section for exposure processing and an alignment stage section for performing alignment, in which the alignment stage is made compact and inexpensive as much as possible. <P>SOLUTION: A light irradiation section 1 irradiates a mask M with exposure light, and an alignment microscope 10 receives a projection image of a mask mark MAM, and position coordinates of the projection image are found and stored. A work W is mounted on the alignment stage AS, the stage AS or alignment microscope 4 is fed in steps at intervals where work marks WAM are formed, and the alignment microscope 4 detects the array of the work marks WAM, and position coordinates thereof are stored. Then a work conveying mechanism 23 conveys the work W to an exposure stage WS and performs alignment so that positions of mark marks MAM and work marks WAM are aligned with each other, and while the exposure stage WS is moved, each exposure region on the work W is exposed in sequence. <P>COPYRIGHT: (C)2010,JPO&INPIT |
