| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of forming a photoresist film on a substrate without using a substrate transfer robot. SOLUTION: The substrate processing apparatus includes a coating module 100 which transfers a substrate 2 horizontally and supplies a photoresist composition to the substrate 2 to form a photoresist film on the substrate 2 during transfer of the substrate 2, a baking module 200 which is disposed adjacent to the coating module 100 and heats the substrate 2 to harden the photoresist film during the horizontal transfer of the substrate 2, and a transfer module 300 which is disposed between the coating module 100 and the baking module 200 and delivers the substrate 2 in the direction of transfer of the substrate 2. COPYRIGHT: (C)2010,JPO&INPIT
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