| 摘要 |
<p>The object is to provide a substrate storage container in which the engagement structure for valve attachment can be simplified, which can prevent displacement of the valve due to repeated usage and prevent incomplete sealing and which is free from the risk of traces of discharged metal ions contaminating the substrates. The container includes a container body for accommodating and aligning semiconductor wafers , a door which opens and closes the front of the container body and a pair of valve units disposed in the bottom of the container body for controlling gas flow with respect to the container body. Each valve unit is comprised of a fixed sleeve for gas flow, fitted in a rib of a through-hole of the container body, a holding sleeve fitted in the through-hole of the container body with an O-ring interposed therebetween and mated and threaded with the fixed sleeve, a check valve built in between the fixed sleeve and the holding sleeve, leaving a clearance, an elastically deformable element for opening and closing the check valve, an interior lid sleeve for gas flow, opposing the check valve and supporting the elastically deformable element, and a filter interposed between the holding sleeve and the interior lid sleeve. <IMAGE></p> |
