APPARATUS FOR PROCESSING SUBSTRATE

摘要

PURPOSE: An apparatus for processing a substrate is provided to improve the delay of the temperature rise of an exhaust hole and a gate by comprising an auxiliary heating part on at least one adjacent position to the gate or the exhaust hole. CONSTITUTION: A reaction space is formed inside a chamber(10). A gate(11) and an exhaust hole(15) are formed inside the chamber. The gate is used for leading the substrate in or out. A auxiliary heating part(100,200) is formed on an adjacent position to the gate or exhaust hole. The auxiliary heating part increases the temperature in the chamber.