发明名称 ASPHERICAL SILICA SOL, PROCESS FOR PRODUCING THE SAME, AND COMPOSITION FOR POLISHING
摘要 <p>An aspherical silica sol which comprises a dispersion medium and, dispersed therein, aspherical fine silica particles which, when examined by the dynamic light scattering method, have an average particle diameter in the range of 3-150 nm, a minor-axis/major-axis ratio in the range of 0.01-0.8, and a specific surface area in the range of 10-800 m2/g and which have warty projections on the surface.  A process for producing the silica sol is also provided.  The aspherical fine silica particles contained in the aspherical silica sol have a peculiar structure different from the structure of ordinary aspherical fine silica particles.  Due to this, the aspherical silica sol is excellent in physical properties such as suitability for filling, oil absorption, and electrical characteristics and in optical properties.  The silica sol is useful, for example, as an abrasive material and a composition for polishing, and is excellent especially in polishing effect.</p>
申请公布号 WO2010052945(A1) 申请公布日期 2010.05.14
申请号 WO2009JP59810 申请日期 2009.05.28
申请人 JGC CATALYSTS AND CHEMICALS LTD.;NISHIDA, HIROYASU;NAKAYAMA, KAZUHIRO 发明人 NISHIDA, HIROYASU;NAKAYAMA, KAZUHIRO
分类号 C01B33/14;B24B37/00;C01B33/151;C09K3/14;H01L21/304 主分类号 C01B33/14
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