METHODS OF MAKING CAPACITORS, DRAM ARRAYS AND ELECTRONIC SYSTEMS
摘要
<p>Some embodiments include methods of making stud-type capacitors utilizing carbon-containing support material. Openings may be formed through the carbon- containing support material to electrical nodes, and subsequently conductive material may be grown within the openings. The carbon-containing support material may then be removed, and the conductive material utilized as stud-type storage nodes of stud- type capacitors. The stud-type capacitors may be incorporated into DRAM, and the DRAM may be utilized in electronic systems.</p>
申请公布号
WO2010019343(A3)
申请公布日期
2010.05.14
申请号
WO2009US50863
申请日期
2009.07.16
申请人
MICRON TECHNOLOGY, INC.;KIEHLBAUCH, MARK;SHEA, KEVIN, R.