发明名称 METHODS OF MAKING CAPACITORS, DRAM ARRAYS AND ELECTRONIC SYSTEMS
摘要 <p>Some embodiments include methods of making stud-type capacitors utilizing carbon-containing support material. Openings may be formed through the carbon- containing support material to electrical nodes, and subsequently conductive material may be grown within the openings. The carbon-containing support material may then be removed, and the conductive material utilized as stud-type storage nodes of stud- type capacitors. The stud-type capacitors may be incorporated into DRAM, and the DRAM may be utilized in electronic systems.</p>
申请公布号 WO2010019343(A3) 申请公布日期 2010.05.14
申请号 WO2009US50863 申请日期 2009.07.16
申请人 MICRON TECHNOLOGY, INC.;KIEHLBAUCH, MARK;SHEA, KEVIN, R. 发明人 KIEHLBAUCH, MARK;SHEA, KEVIN, R.
分类号 H01L27/108;H01L21/8242 主分类号 H01L27/108
代理机构 代理人
主权项
地址