发明名称 THIN-FILM MIM CAPACITOR AND METHOD OF MANUFACTURING THE SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a thin-film MIM capacitor that can obtain sufficient effect of preventing deterioration of insulating characteristics and leak current characteristics, and to provide a method of manufacturing the thin-film MIM capacitor. <P>SOLUTION: The thin-film MIM capacitor 1 has a lower electrode 3, a base metal thin film 4, a dielectric thin film 5, and an upper electrode 6 laminated in order on a substrate 2. The base metal thin film 4, dielectric thin film 5, and upper electrode 6 are formed to have substantially the same area respectively, and the lower electrode 3 has a shape different from those of other thin films so as to form a connection part with the outside. Side surfaces of the base metal thin film 4, dielectric thin film 5, and upper electrode 6 are covered with base metal oxide 7 containing the same metal atom with the base metal thin film 4. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010109014(A) 申请公布日期 2010.05.13
申请号 JP20080277299 申请日期 2008.10.28
申请人 TAIYO YUDEN CO LTD 发明人 TAKAHASHI TOMOYUKI;MORITO KENTARO;SASAJIMA YUICHI;TAKE NOBUAKI
分类号 H01L21/822;H01G4/12;H01L27/04 主分类号 H01L21/822
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