| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate holder in which a fixing force between the top face of the substrate holder and the rear of a substrate does not cause a problem. <P>SOLUTION: A lithographic device includes an illumination system supplying the beams of radiation, and an article supporter 5 supporting a flat article arranged in the path of the beam of radiation. The lithographic device further includes a back-fill gas supply arranged to the article supporter for supplying the rear of the article with a back-fill gas when the article is supported by a supporting means, and a clamp 3 clamping the article to the article supporter during a projection. In this case, the device includes a controller 2 adjusting the clamp and/or a back-fill supply pressure with the object of the release of the clamp before the back-fill gas supply pressure is reduced. <P>COPYRIGHT: (C)2010,JPO&INPIT |
