发明名称 MANUFACTURING METHOD OF CONTACT PROBE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a contact probe forming the contact probe having a plurality of curved parts by a simple method and with fewer manufacturing steps. SOLUTION: The manufacturing method of the contact probe includes steps of: forming sacrifice layer foundation films 5a, 6b and a probe foundation film 6a in a mutually insulated state on a substrate 107; forming a resist layer 71 covering the sacrifice layer foundation films and the probe foundation film over the substrate 107 and forming on the resist layer 71 two or more of long and thin opening parts 71a for exposing the sacrifice layer foundation film and the probe foundation film formed sandwiching an insulating domain 41 in between; forming a sacrifice layer 8 by depositing a conductive material on the sacrifice layer foundation film exposed in each of the opening parts; and forming a cantilever beam structure contact probe by depositing a probe forming conductive material on the sacrifice layer formed in each of the openings, by conductively connecting the sacrifice layer with the probe foundation film through the deposited probe forming conductive material, and also by depositing the conductive material on the probe foundation film. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010107245(A) 申请公布日期 2010.05.13
申请号 JP20080277177 申请日期 2008.10.28
申请人 JAPAN ELECTRONIC MATERIALS CORP 发明人 FUKUSHIMA NORIYUKI;KIMURA TEPPEI;TAJIMA SHOHEI
分类号 G01R1/073;H01L21/66 主分类号 G01R1/073
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