发明名称 SEMICONDUCTOR WAFER AND METHOD OF SEPARATING THE SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a semiconductor wafer which allows separating with excellent straightness while suppressing an increase in the number of modified regions. <P>SOLUTION: The semiconductor wafer includes a semiconductor substrate 7 that has multiple predetermined separation lines 3 extending from the upper surface to the lower surface and multiple chip regions 2 delimited by the predetermined separation lines 3. Tensile stress is applied to regions having the predetermined separation lines 3 of the semiconductor substrate 7, thus facilitating separation of the semiconductor wafer. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010109230(A) 申请公布日期 2010.05.13
申请号 JP20080281107 申请日期 2008.10.31
申请人 PANASONIC CORP 发明人 KUMAKAWA TAKAHIRO;KOJIMA HIDEKI;FURUKAWA TOMOAKI
分类号 H01L21/301;B23K26/00;B23K26/38;B23K101/40 主分类号 H01L21/301
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