发明名称 |
SEMICONDUCTOR WAFER AND METHOD OF SEPARATING THE SAME |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a semiconductor wafer which allows separating with excellent straightness while suppressing an increase in the number of modified regions. <P>SOLUTION: The semiconductor wafer includes a semiconductor substrate 7 that has multiple predetermined separation lines 3 extending from the upper surface to the lower surface and multiple chip regions 2 delimited by the predetermined separation lines 3. Tensile stress is applied to regions having the predetermined separation lines 3 of the semiconductor substrate 7, thus facilitating separation of the semiconductor wafer. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
申请公布号 |
JP2010109230(A) |
申请公布日期 |
2010.05.13 |
申请号 |
JP20080281107 |
申请日期 |
2008.10.31 |
申请人 |
PANASONIC CORP |
发明人 |
KUMAKAWA TAKAHIRO;KOJIMA HIDEKI;FURUKAWA TOMOAKI |
分类号 |
H01L21/301;B23K26/00;B23K26/38;B23K101/40 |
主分类号 |
H01L21/301 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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