发明名称 METHOD FOR PRODUCING GROUP III ELEMENT NITRIDE CRYSTAL, GROUP III ELEMENT NITRIDE CRYSTAL, SUBSTRATE FOR FORMING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a group III element nitride crystal, in which reactions between an alkali metal and each of oxygen and water can be prevented and a growth rate of the group III element nitride crystal is improved. SOLUTION: The method for producing the group III element nitride crystal comprises the steps of: putting a group III element, the alkali metal and a seed crystal substrate 20 of the group III element nitride in a crystal growing vessel 18; and pressurizing/heating the inside of the crystal growing vessel 18 in a nitrogen-containing gas atmosphere to grow the group III element nitride crystal while using the seed crystal substrate 20 as a core, further concretely, comprises the steps of: preparing a first hydrocarbon and a second hydrocarbon having the boiling point higher than that of the first hydrocarbon; putting the alkali metal, which is coated with at least the first hydrocarbon of the first and second hydrocarbons, in the crystal growing vessel 18 before the inside of the crystal growing vessel 18 is pressurized/heated; removing the first hydrocarbon used for coating the alkali metal from the crystal growing vessel 18; and pressurizing/heating the inside of the crystal growing vessel 18 in the presence of the second hydrocarbon to grow the group III element nitride crystal. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010105850(A) 申请公布日期 2010.05.13
申请号 JP20080279321 申请日期 2008.10.30
申请人 PANASONIC CORP 发明人 YAMADA OSAMU;MINEMOTO TAKASHI;HIRANAKA KOICHI;HATAYAMA TAKESHI;MORI YUSUKE;SASAKI TAKATOMO;KAWAMURA SHIRO;KITAOKA YASUO
分类号 C30B29/38;C30B19/02;H01L21/208 主分类号 C30B29/38
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