SUBSTRATE FOR SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE EQUIPMENT, DESIGN SYSTEM, MANUFACTURE METHOD AND DESIGN METHOD

摘要

PROBLEM TO BE SOLVED: To provide a substrate for semiconductor device wherein quality and thickness of a crystal thin film are uniform. SOLUTION: The substrate for semiconductor device includes: a thin film 112 for device for forming a semiconductor device; an inhibiting part 114 which surrounds the thin film for device to inhibit a precursor of the thin film for device from growing to be a crystal; a sacrifice growth part 116 which is formed by sacrifice-growing the precursor to be a crystal and is provided around the thin film for device while being separated from it by the inhibiting part; and a protective film which covers the top of the sacrifice growth part 116 while exposes the top of the thin film for device. The protective film may be a polyimide. COPYRIGHT: (C)2010,JPO&INPIT