| 摘要 |
The present invention relates to a lithography system in which intensities of individually modulated beams from a multitude of beams are determined, comprising a measuring device with a sensor having a sensor area adapted for simultaneously sensing a plurality of beams and providing an aggregated signal thereof. The beams are individually modulated according to associated temporal blanking patterns. The present invention further relates to a method for calculating individual beam intensities dependent on the measured aggregated signal and the temporal blanking patterns of the beams.
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