发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 A semiconductor device includes a first transistor, a second transistor, a first interconnect, a second interconnect, and a first gate electrode. The first gate electrode is a gate electrode of the first and second transistors and extends linearly over first and second channel regions. In addition, a first source of the first transistor is located at the opposite side of a second source of the second transistor with the first gate electrode interposed therebetween, and a first drain of the first transistor is located at the opposite side of a second drain of the second transistor with the first gate electrode interposed therebetween.
申请公布号 US2010117156(A1) 申请公布日期 2010.05.13
申请号 US20090617434 申请日期 2009.11.12
申请人 NEC ELECTRONICS CORPORATION 发明人 TSUTSUI GEN;IMAI KIYOTAKA
分类号 H01L27/088;H01L21/8234 主分类号 H01L27/088
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