摘要 |
A member of an immersion exposure apparatus for exposing an image of a pattern of an original on a substrate via a liquid, and configured to be in contact with the liquid, includes a base portion, and a plurality of protruded portions provided on the base portion, wherein a contact angle &thetas; of a material of a surface of the protruded portions before the protruded portions are exposed with light from a light source is larger than 90 degrees with respect to the liquid, and wherein, a value obtained by dividing a sum of a surface area of a face of the base portion on which the plurality of protruded portions are provided and the surface area of the plurality of protruded portions, by an area of the face of the base portion on which the plurality of protruded portions are provided, is r, r>1/|cos &thetas;| is satisfied. |