METHOD FOR CLEANING A SUBSTRATE

摘要

PURPOSE: A method for cleaning a substrate is provided to suppress the generation of protruded type derivatives by removing residue on the surface of a substrate with ozone wafer and diluted fluoric acid. CONSTITUTION: After a mirror-like polishing process is performed to a substrate, ozone water is supplied to clean the substrate(S110). A diluted fluoric acid is supplied to clean the substrate(S120). The ozone water is additionally supplied to clean the substrate(S130). A first standard cleaning solution is repeatedly supplied to remove particles and organics on the surface of the substrate(S200). A second standard cleaning solution and the first standard cleaning solution are successively supplied to remove metal impurities from the substrate(S300).