| 摘要 |
<p>PURPOSE: A photoresist composition is provided to improve the resolution, the development contrast, the adhesive force, the photosensitive speed, the remaining rate of a film, and the heat resistance. CONSTITUTION: A photoresist composition contains an alkali-soluble resin, a photo sensitive compound, a colloid phase inorganic material and an organic solvent. 1~50 wt% of colloid phase inorganic material is mixed for the sum of total amounts of the alkali-soluble resin and the photo sensitive compound. 5~50 parts of photo sensitive compound by weight is mixed for the 100 parts of alkali-soluble resin and the colloid phase inorganic material by weight. 10~50wt% of organic solvent is mixed for the total amount of the total composition.</p> |
