| 摘要 |
PURPOSE: A chemically amplified positive photoresist composition is provided to improve the stickiness for a substrate, and to reduce a standing wave effect generated on a side of a resist pattern. CONSTITUTION: A chemically amplified positive photoresist composition contains a resin, a photoacid generator, an additive including an anthracene derivative, and a quencher. The resin includes a resin component selected from the group consisting of a first resin containing a first unit marked as chemical formula 1a, and a second unit marked as chemical formula 1b in a mol ratio of 2:8~5:5, a second resin, a third resin, and their mixture. |
