发明名称 RADIATION-SENSITIVE RESIN COMPOSITION, INTERLAYER INSULATING FILM AND MICROLENS, AND METHOD FOR FORMING THE SAME
摘要 PURPOSE: A radioactive ray-sensitive resin composition, an inter-layer insulating film, a micro lens using thereof, and formation methods thereof are provided to improve the sensitivity of the composition to a radioactive ray, and to form an improved pattern form ever when exceeding an optimum development time during a development process. CONSTITUTION: A radioactive ray-sensitive resin composition contains an alkali-soluble resin, a 1,2-quinonediazide compound, and a compound including a structure originated from trimethylolpropane, pentaerythritol or isocyanurate while containing more than one ethylenical unsaturated bond. The formation method of an inter-layer insulating film comprises the following steps: forming a film of the radiation-sensitive resin composition on a substrate; partially irradiating radioactive rays on the film; developing the film irradiated with the radioactive ray; and heating the developed film.
申请公布号 KR20100047124(A) 申请公布日期 2010.05.07
申请号 KR20090093973 申请日期 2009.10.01
申请人 JSR CORPORATION 发明人 KINOSHITA YOSHINORI;HANAMURA MASAAKI;DOI TAKASHI;TAKASE HIDEAKI
分类号 G03F7/027;G03F7/022 主分类号 G03F7/027
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