| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a surface treating agent for a freezing process, satisfying such requirements that in a freezing process applied to a first resist pattern in a double patterning method, the line width and LWR (line width roughness) of the first resist pattern do not change by the freezing process and by the formation of a second resist pattern, and to provide a surface treatment method using the agent and a method for forming a resist pattern. <P>SOLUTION: The surface treating agent for a resist pattern contains two or more kinds of polymers and/or oligomers in different weight average molecular weights from each other, the polymers and/or oligmers having a structure expressed by general formula (1). In the formula, X represents a single bond or a divalent linking group; and * represents a linking moiety with a polymer and/oligomer residue. <P>COPYRIGHT: (C)2010,JPO&INPIT |
