| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive composition which is excellent in transparency and provides a permanent resist having such high heat resistance and chemical resistance after high-heat history that it is also used as an insulating film above an active matrix substrate, a permanent resist using the positive photosensitive composition and a method for producing the same. <P>SOLUTION: The positive photosensitive composition includes (A) a silicone resin having at least two groups per molecule represented by general formula (1) (wherein, R<SP>1</SP>denotes a 1-10C alkylene group which may have a substituted hydrocarbon group, R<SP>2</SP>denotes a 1-4C alkyl group, a denotes an integer of 0 or 1-4, b denotes an integer of 1-3, and a+b does not exceed 5), (B) a siloxane compound having a glycidyl group, (C) diazonaphthoquinones and (D) an organic solvent. The permanent resist is produced by applying the positive photosensitive composition on a substrate and subjecting the resulting coating to exposure, alkali development and post-bake at 120-350°C. <P>COPYRIGHT: (C)2010,JPO&INPIT |
