| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve the efficiency of exposure processing by simultaneously forming two kinds of exposure patterns having different required resolutions from each other in the same exposure step. <P>SOLUTION: An exposure pattern is formed on a TFT substrate 8 coping with a plurality of mask patterns formed on a photomask 3 by intermittently irradiating the TFT substrate 8 through the photomask 3 with light 24 from a light source while conveying the TFT substrate 8 in one direction. The photomask 3 has an electrode wiring pattern 14 and a signal wiring pattern 17 in different required resolving powers from each other, formed on one surface of the mask such that an electrode wiring pattern group 16 comprising a plurality of electrode wiring patterns 14 and a signal wiring pattern group 18 comprising a plurality of signal wiring patterns 17 are sequentially formed along a conveying direction of the TFT substrate 8. On the other surface of the photomask, a microlens 19 that reduces and projects the electrode wiring pattern 14 having a high required resolving powder onto the TFT substrate 8 is formed coping with the electrode wiring pattern. The photomask is disposed with the microlens 19 side close to the TFT substrate 8. <P>COPYRIGHT: (C)2010,JPO&INPIT |
