发明名称 Schichtstruktur, deren Anwendung und Verfahren zur Herstellung einer Schichtstruktur
摘要 <p>The invention relates to a layered structure comprising a substrate (3) consisting of a substrate material and an anti-corrosion and/or anti-oxidation layer (1) comprising sacrificial anode material on the substrate (3). The anti-corrosion and/or anti-oxidation layer (1) comprises nanoscale sacrificial anode particles (5) consisting of the sacrificial anode material. The sacrificial anode particles (5, 105) are encapsulated in encapsulation material (7) that differs from the sacrificial anode material.</p>
申请公布号 DE102006044706(B4) 申请公布日期 2010.05.06
申请号 DE20061044706 申请日期 2006.09.20
申请人 SIEMENS AG 发明人 JABADO, RENE;JENSEN, JENS DAHL;KRUEGER, URSUS;KOERTVELYESSY, DANIEL;LUETHEN, VOLKMAR;REICHE, RALPH;RINDLER, MICHAEL;ULLRICH, RAYMOND
分类号 C23F13/14;C09D5/10;F01D5/28 主分类号 C23F13/14
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