发明名称 |
Schichtstruktur, deren Anwendung und Verfahren zur Herstellung einer Schichtstruktur |
摘要 |
<p>The invention relates to a layered structure comprising a substrate (3) consisting of a substrate material and an anti-corrosion and/or anti-oxidation layer (1) comprising sacrificial anode material on the substrate (3). The anti-corrosion and/or anti-oxidation layer (1) comprises nanoscale sacrificial anode particles (5) consisting of the sacrificial anode material. The sacrificial anode particles (5, 105) are encapsulated in encapsulation material (7) that differs from the sacrificial anode material.</p> |
申请公布号 |
DE102006044706(B4) |
申请公布日期 |
2010.05.06 |
申请号 |
DE20061044706 |
申请日期 |
2006.09.20 |
申请人 |
SIEMENS AG |
发明人 |
JABADO, RENE;JENSEN, JENS DAHL;KRUEGER, URSUS;KOERTVELYESSY, DANIEL;LUETHEN, VOLKMAR;REICHE, RALPH;RINDLER, MICHAEL;ULLRICH, RAYMOND |
分类号 |
C23F13/14;C09D5/10;F01D5/28 |
主分类号 |
C23F13/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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