发明名称 |
Organic thin film transistor substrate and method of manufacturing the same |
摘要 |
The present invention provides an organic thin film transistor substrate and a method of manufacturing the same capable of uniformly forming the thickness of a gate insulating layer and a protective layer and preventing overflow of an organic semiconductive layer. The organic thin film transistor according to the present invention comprises a gate line formed on a substrate; a data line which intersects the gate line with an organic gate insulating layer interposed therebetween to define a pixel area; a thin film transistor connected with the gate line and the data line and which includes an organic semiconductive layer; a pixel electrode connected with the thin film transistor and formed in the pixel area; an organic protective layer formed parallel with the gate line to cover the organic semiconductive layer and its peripheral area; a first border insulating layer stepwise formed so that the organic gate insulating layer and the protective layer are filled, and a second border insulating layer formed on the source electrode and the drain electrode of the thin film transistor so that the organic semiconductive layer is filled.
|
申请公布号 |
US7709834(B2) |
申请公布日期 |
2010.05.04 |
申请号 |
US20070828971 |
申请日期 |
2007.07.26 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHO SEUNG HWAN;SONG KEUN KYU;YOON MIN HO |
分类号 |
H01L35/24;H01L51/00 |
主分类号 |
H01L35/24 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|