发明名称 Organic thin film transistor substrate and method of manufacturing the same
摘要 The present invention provides an organic thin film transistor substrate and a method of manufacturing the same capable of uniformly forming the thickness of a gate insulating layer and a protective layer and preventing overflow of an organic semiconductive layer. The organic thin film transistor according to the present invention comprises a gate line formed on a substrate; a data line which intersects the gate line with an organic gate insulating layer interposed therebetween to define a pixel area; a thin film transistor connected with the gate line and the data line and which includes an organic semiconductive layer; a pixel electrode connected with the thin film transistor and formed in the pixel area; an organic protective layer formed parallel with the gate line to cover the organic semiconductive layer and its peripheral area; a first border insulating layer stepwise formed so that the organic gate insulating layer and the protective layer are filled, and a second border insulating layer formed on the source electrode and the drain electrode of the thin film transistor so that the organic semiconductive layer is filled.
申请公布号 US7709834(B2) 申请公布日期 2010.05.04
申请号 US20070828971 申请日期 2007.07.26
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHO SEUNG HWAN;SONG KEUN KYU;YOON MIN HO
分类号 H01L35/24;H01L51/00 主分类号 H01L35/24
代理机构 代理人
主权项
地址