发明名称 ANODE FOR ELECTROLYSIS PLATING AND APPARATUS OF ELECTROLYSIS PLATING USING THE SAME
摘要 PURPOSE: An anode for an electrolysis plating and an apparatus of the electrolysis plating using thereof are provided to perform a uniform plating by minimizing the surface current density deviation. CONSTITUTION: An anode(20) for an electrolysis plating comprises plural openings. Both edges(25) of the anode are insulated by being coated with a nonconductive material. The anode is formed in a mesh net-like structure. The apparatus of the electrolysis plating comprises an electrolytic tank, a cathode fixing unit, a manifold, and the anode. The cathode fixing unit fixes an object to plate in the inside of the electrolytic tank.
申请公布号 KR20100044608(A) 申请公布日期 2010.04.30
申请号 KR20080103813 申请日期 2008.10.22
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 CHOI, YUNN HONG;CHOI, CHANG HWAN;MOON, WON HA;PARK, CHANG HWAN;YOO, DAL HYUN;YOON, HEE SOO
分类号 C25D17/10 主分类号 C25D17/10
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