| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an imaging device and an imaging system, which reduce optical color mixture resulting from diffraction by an interconnection that specifies an aperture region. <P>SOLUTION: The imaging device and the imaging system include a semiconductor substrate, having an imaging region in which a pixel unit arrangement in which a plurality of pixel units is arranged in a horizontal direction and in a vertical direction is disposed. and a multilayer interconnecting structure which specifies the aperture region, regarding each of a plurality of photoelectric conversion portions in each of the plurality of pixel units, wherein the multilayer interconnection structure includes a first interconnection layer ML1, disposed above the semiconductor substrate so as to specify the horizontal contour side of the aperture region, regarding each of the plurality of the photoelectric conversion portions, and a second interconnection layer ML2 disposed above the first interconnection layer so as to specify the vertical contour side of the aperture region in regard to each of the plurality of photoelectric conversion portions. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
