| 发明名称 |
PROCESS AND HARDWARE FOR PLASMA TREATMENTS |
| 摘要 |
A H2O vapor based dry plasma process for pre-treating and strip-cleaning a reticle, a three layer gas distribution plate (GDP) assembly to control the heat load to the reticle during the plasma process, and a modified hole pattern for the GDP that further enhances stripping of resist from the edges of the reticle are disclosed.
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| 申请公布号 |
US2010104953(A1) |
申请公布日期 |
2010.04.29 |
| 申请号 |
US20080258271 |
申请日期 |
2008.10.24 |
| 申请人 |
PAPANU JAMES S;GOUK ROMAN;CHEN HAN-WEN;PETERS PHILLIP |
发明人 |
PAPANU JAMES S.;GOUK ROMAN;CHEN HAN-WEN;PETERS PHILLIP |
| 分类号 |
G03F1/00 |
主分类号 |
G03F1/00 |
| 代理机构 |
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