发明名称 APPLICATION OF A SELF-ASSEMBLED MONOLAYER AS AN OXIDE INHIBITOR
摘要 An embodiment is directed to a method of forming a self assembled monolayer to reduce formation of an oxide. The method includes applying an inhibitor to a substrate including conductive contacts and processing the substrate and inhibitor to form the self assembled monolayer.
申请公布号 US2010101840(A1) 申请公布日期 2010.04.29
申请号 US20080260471 申请日期 2008.10.29
申请人 RAYTHEON COMPANY 发明人 HAMPP ANDREAS;COBB CHRISTINE
分类号 H05K1/09;B05D5/12;H05K3/36 主分类号 H05K1/09
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