发明名称 |
APPLICATION OF A SELF-ASSEMBLED MONOLAYER AS AN OXIDE INHIBITOR |
摘要 |
An embodiment is directed to a method of forming a self assembled monolayer to reduce formation of an oxide. The method includes applying an inhibitor to a substrate including conductive contacts and processing the substrate and inhibitor to form the self assembled monolayer.
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申请公布号 |
US2010101840(A1) |
申请公布日期 |
2010.04.29 |
申请号 |
US20080260471 |
申请日期 |
2008.10.29 |
申请人 |
RAYTHEON COMPANY |
发明人 |
HAMPP ANDREAS;COBB CHRISTINE |
分类号 |
H05K1/09;B05D5/12;H05K3/36 |
主分类号 |
H05K1/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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