发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE HAVING IMPROVED PUNCH-THROUGH RESISTANCE AND PRODUCTION METHOD THEREOF, SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING A LOW-VOLTAGE TRANSISTOR AND HIGH-VOLTAGE TRANSISTOR
摘要 An integrated circuit device comprises a memory cell well formed with a flash memory device, first and second well of opposite conductivity types for formation of high voltage transistors, and third and fourth wells of opposite conductivity types for low voltage transistors, wherein at least one of the first and second wells and at least one of the third and fourth wells have an impurity distribution profile steeper than the memory cell well.
申请公布号 US2010105180(A1) 申请公布日期 2010.04.29
申请号 US20090651058 申请日期 2009.12.31
申请人 FUJITSU MICROELECTRONICS LIMITED 发明人 EMA TAIJI;KOJIMA HIDEYUKI;ANEZAKI TORU
分类号 H01L21/336;H01L21/762;H01L21/8238;H01L21/8247;H01L27/105;H01L29/788 主分类号 H01L21/336
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