| 摘要 |
Provided is an exposure apparatus wherein a TFT substrate (8) is intermittently irradiated with light (24) from a light source through a photomask (3), while transferring the TFT substrate (8) in one direction, and an exposure pattern is formed on the TFT substrate (8) corresponding to a plurality of mask patterns formed on the photomask (3). On one surface of the photomask (3), an electrode wiring pattern (14) and a signal wiring pattern (17) having different requested resolution powers are formed, and an electrode wiring pattern group (16) composed of the electrode wiring patterns (14) and a signal wiring pattern group (18) composed of signal wiring patterns (17) are formed in sequence in the transfer direction of the TFT substrate (8), and on the other surface of the photomask, a microlens (19) which reduces and projects the pattern (14) having the high requested resolution power on the TFT substrate (8) corresponding to such pattern. The photomask is arranged such that the microlens (19) side is on the TFT substrate (8) side. Thus, the two types of exposure patterns having different requested resolution powers are formed at the same time in the same exposure step, and exposure efficiency is improved. |
