发明名称 CAPACITIVELY COUPLED REMOTE PLASMA SOURCE WITH LARGE OPERATING PRESSURE RANGE
摘要 A radio frequency (RF) coaxial resonator feeding a saltshaker-like gas distributing electrode assembly forms a capacitively coupled plasma source. This apparatus can generate plasma of high density over a wide pressure range and large process window. The system may be used as a remote radical-rich plasma source for materials surface processing.
申请公布号 US2010101727(A1) 申请公布日期 2010.04.29
申请号 US20090606745 申请日期 2009.10.27
申请人 JI HELIN 发明人 JI HELIN
分类号 H01L21/3065 主分类号 H01L21/3065
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