| 发明名称 |
FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
A fluid handling structure and lithographic apparatus is disclosed in which measures are taken, in particular to the dimensions and spacing of an array of openings in a bottom surface of the fluid handling structure, to deal with and/or prevent formation of bubbles in immersion liquid.
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| 申请公布号 |
US2010103391(A1) |
申请公布日期 |
2010.04.29 |
| 申请号 |
US20090582919 |
申请日期 |
2009.10.21 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN DEN DUNGEN CLEMENS JOHANNES GERARDUS;PHILIPS DANNY MARIA HUBERTUS;STEFFENS KOEN;GUNTHER TIJMEN WILFRED MATHIJS;BESSEMS DAVID |
| 分类号 |
G03B27/52;G03B27/32 |
主分类号 |
G03B27/52 |
| 代理机构 |
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代理人 |
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