发明名称 SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SAME, AND DISPLAY DEVICE
摘要 A semiconductor device comprising a thin-film transistor (125) and a thin-film diode (126).  A semiconductor layer (108) of the thin-film transistor (125) and a semiconductor layer (109) of the thin-film diode (126) are crystalline semiconductor layers formed by crystallizing a same crystalline semiconductor film.  The surface of the semiconductor layer (109) of the thin-film diode (126) is provided with a ridge.  The surface roughness of the semiconductor layer (109) of the thin-film diode (126) is larger than the surface roughness of the semiconductor layer (108) of the thin-film transistor (125).
申请公布号 WO2010047086(A1) 申请公布日期 2010.04.29
申请号 WO2009JP05478 申请日期 2009.10.20
申请人 SHARP KABUSHIKI KAISHA;MAKITA, NAOKI;NAKATSUJI, HIROSHI 发明人 MAKITA, NAOKI;NAKATSUJI, HIROSHI
分类号 H01L27/14;G02F1/1368;G09F9/33;H01L21/336;H01L29/786;H01L31/10 主分类号 H01L27/14
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