发明名称 SUBSTRATE-CONVEYING DEVICE
摘要 One problem associated with substrate-conveying devices is that, when a first substrate (1) has been placed on a supply lift (11) and is being conveyed from an upper workbench (10) to a lower workbench (20), a wait is imposed on a second substrate (2) which has finished undergoing an ultraviolet cleaning process on the upper workbench (10) as shown in Figure 2, and, consequently, productivity is reduced due to the delay in supplying other substrates through a supply and discharge part (15). The present invention comprises a substrate-conveying device in which a substrate supplied from an upper first position is conveyed to a height at a lower second position, and the substrate which has been conveyed to the second lower position is moved and discharged by means of a conveying rail; wherein the substrate-conveying device is constructed in such a way that first and second upper rotational supports and first and second lower rotational supports rotate in a state in which they are spaced apart from each other vertically.
申请公布号 WO2010005246(A3) 申请公布日期 2010.04.29
申请号 WO2009KR03759 申请日期 2009.07.09
申请人 INATECH CO., LTD.;SHIN, DONG-HYUK 发明人 SHIN, DONG-HYUK
分类号 H01L21/68 主分类号 H01L21/68
代理机构 代理人
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