发明名称 |
IMPRINT LITHOGRAPHY SYSTEM AND METHOD |
摘要 |
System, method and process for imprinting a substrate using controlled deformation of a substrate and/or a template. The substrate and/or template may be positioned in single wave formation or double wave formation during an imprint lithography process. |
申请公布号 |
WO2010047788(A2) |
申请公布日期 |
2010.04.29 |
申请号 |
WO2009US05721 |
申请日期 |
2009.10.21 |
申请人 |
MOLECULAR IMPRINTS, INC. |
发明人 |
GANAPATHISUBRAMANIAN, MAHADEVAN;CHOI, BYUNG-JIN;MEISSL, MARIO, JOHANNES |
分类号 |
B29C47/76;B29C59/02 |
主分类号 |
B29C47/76 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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