发明名称 Absorbing pad composition for polishing, Absorbing pad for polishing and Method of manufacturing thereof
摘要 PURPOSE: A polyurethane adsorption pad composition for polishing, a polyurethane adsorption pad for polishing, and a method for manufacturing the same are provided to shorten time using a dry preparation process instead of a conventional wet preparation process and to enhance frictional force using an elastic body chip or polybutadiene. CONSTITUTION: A polyurethane adsorption pad composition for polishing comprises a polyurethanes base resin 100 parts by weight, and a frictional force-imparting material 1 - 30 parts by weight consisting of at least one of solid elastic body chip with 5.0μm particle size or liquid rubber material. The elastic body chip is made of any one of crushed material of waste rubber, styrene copolymers such as SBR, SBS, SEBS, SEPS, EPDM, and EPM.
申请公布号 KR100955032(B1) 申请公布日期 2010.04.28
申请号 KR20080046425 申请日期 2008.05.20
申请人 发明人
分类号 C08L75/04;B24D11/00;C08K7/16;C08L21/00 主分类号 C08L75/04
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