发明名称 PROCESS FOR PRODUCING METAL FILM, METAL FILM AND USE OF THE METAL FILM
摘要 <p>This invention provides a process for producing a metal film, which can form a metal film and a metal pattern at low cost on any substrate and can solve a problem involved in a sputtering method, a metal film, and the use of the metal film. The process for producing a metal film comprises an organic film forming step of forming an organic film using a primer composition comprising an addition polymerizable compound containing three or more reactive groups, an acidic group-containing addition polymerizable compound, and a hydrophilic functional group-containing addition polymerizable compound, a metal salt producing step of converting the acidic group to a metal (M1) salt, a metal fixing step of treating the metal (M1) salt of the acidic group with an aqueous metal (M2) ion solution containing a meal (M2) ion having a lower ionization tendency than the metal (M1) ion to convert the metal (M1) salt of the acidic group to a metal (M2) salt, a reducing step of reducing the metal (M2) ion to form a metal film on the surface of the organic film, and an oxidizing step of oxidizing the metal film.</p>
申请公布号 KR20100043241(A) 申请公布日期 2010.04.28
申请号 KR20107003469 申请日期 2008.11.14
申请人 OMRON CORPORATION 发明人 NAKAJIMA SEIJI;HAYASE TETSUO;MORI TETSUYA
分类号 C23C18/16;C23C18/18;C23C18/20;H01B13/00 主分类号 C23C18/16
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