发明名称 APPARATUS AND METHOD FOR TREATING SUBSTRATE AND PRINTING MACHINE
摘要 <P>PROBLEM TO BE SOLVED: To improve the quality of printing by efficiently controlling a substrate treating agent at an appropriate temperature in an apparatus and a method for treating a substrate and a printing machine. Ž<P>SOLUTION: A substrate treating agent feeding apparatus 44 includes a first substrate treating agent circulating line which can circulate and convey the substrate treating agent and can feed the substrate treating agent to a substrate treating agent feeding roll 42a, a heating apparatus (a temperature controlling means) 57 for controlling the temperature of the substrate treating agent circulated and conveyed in the first substrate treating agent circulating line in a preset temperature region, a defoaming means for removing bubbles generated with the substrate treating agent circulated and conveyed in the first substrate treating agent circulating line, and a substrate treating agent supplementing means for supplementing the substrate treating agent into the first substrate treating agent circulating line. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010089419(A) 申请公布日期 2010.04.22
申请号 JP20080262938 申请日期 2008.10.09
申请人 MITSUBISHI HEAVY IND LTD 发明人 OMAE FUMIKO;TABUCHI MITSURU;OKAZAKI KATSUTOSHI;NISHIYAMA KOJI
分类号 B41F23/00 主分类号 B41F23/00
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