发明名称 METHOD FOR SELECTING POLISHING SHEET FOR POLISHING PAD
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for selecting a polishing sheet for a polishing pad, so as to appropriate a wear degree and stabilize polishing performances while taking the lifetime into consideration. <P>SOLUTION: The polishing pad has a urethane sheet of a foamed structure having a polishing face. The urethane sheet is selected from sheets prepared by slicing a foamed material comprising a mixture of a polyisocyanate compound, a polyol compound, water and a polyamine compound. A sheet having an F value, which is defined by F=-36.7&times;HSC-758.8&times;R+656&times;D-619&times;T+2,587, in a range from 100 to 200 is selected as a favorable product. In the above definition, HSC represents a content rate of a hard segment, R represents an equivalent ratio of the total of hydroxy groups in the polyol compound and amino groups in the polyamine compound with respect to isocyanate groups of the polyisocyanate compound, D represents bulk density and T represents a thickness. The F value correlates with easiness of wear on the polishing face while taking the lifetime into consideration. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010090258(A) 申请公布日期 2010.04.22
申请号 JP20080261099 申请日期 2008.10.07
申请人 FUJIBO HOLDINGS INC 发明人 ITOYAMA MITSUNORI;TAKAHASHI DAISUKE;MIYAZAWA FUMIO
分类号 C08J5/14;B24B37/20;B24D3/32;C08G18/10;C08G101/00;H01L21/304 主分类号 C08J5/14
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