发明名称 APPARATUS FOR INSPECTING MICROPROJECTION
摘要 PROBLEM TO BE SOLVED: To inspect the height of a microprojection on a sample at high speed and with high accuracy. SOLUTION: Light from a light source 201 enters the sample 2001 through a first half mirror 221, a polarizer 202, imaging lenses 203 and 204, a loopback mirror 205 and an objective 206. Reflected light from the sample 2001 passes through the same route reversely and is reflected by the first half mirror 221 and split into two detection beams by a second half mirror 222. The two detection beams are shaped respectively into semicircular optical beams by a first knife edge 2071 in a first detection-side imaging lens 2081 and by a second knife edge 2072 in a second detection-side imaging lens 2082 and detected respectively by a first optical sensor 2101 and a second optical sensor 2102. Since the first knife edge 2071 and the second knife edge 2072 are set in right-angle directions, the microprojection on the sample can be detected at high speed and with uniform sensitivity, not depending on the direction of polarization of an incident beam on the sample 2001. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010091343(A) 申请公布日期 2010.04.22
申请号 JP20080260006 申请日期 2008.10.06
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 MATSUMOTO SHUNICHI;YOSHITAKE YASUHIRO;KATO NOBORU;YAMAGUCHI KIYOMI;MAKIOKA ATSUSHI;HIROI SHUICHI
分类号 G01B11/02;G01N21/956 主分类号 G01B11/02
代理机构 代理人
主权项
地址