| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a unit for supplying a treatment liquid, which advances a process for applying a photosensitive liquid to a substrate, and to provide an apparatus and a method for treating the substrate by using the unit. Ž<P>SOLUTION: The unit for supplying the treatment liquid and the apparatus and method for treating the substrate by using the unit are disclosed. A pre-wet nozzle 436, a photosensitive liquid nozzle 434 and an EBR nozzle 438 are attached to a single nozzle arm 432. The constitution can reduce a space for installing equipment as compared with a case that respective nozzles 434, 436, 438 are attached to individual nozzle arms, and thereby an application degree of the space for installing the equipment can be improved. Further, process time of operation for selecting nozzles in process advance can be shortened. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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